TY  - CONF
AU  - Grantham, Steven
AU  - Tarrio, Charles
AU  - Hill, Shannon
AU  - Richter, Lee
AU  - van, J.
AU  - Kaya, C.
AU  - Harned, N.
AU  - Hoefnagels, R.
AU  - Silova, M.
AU  - Steinhoff, J.
C2  - EUV Lithography 2011, San Jose, CA
DA  - 2011-08-29
LA  - en
M1  - 7969
PB  - EUV Lithography 2011, San Jose, CA
PY  - 2011
TI  - The NIST EUV facility for advanced photoresist qualification using the witness-sample test
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908029
ER  -