TY  - CONF
AU  - Zhang, Nien
AU  - Postek, Michael
AU  - Larrabee, Robert
AU  - Carroll, L
AU  - Keery, William
C2  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor, Santa Clara, CA, USA
DA  - 1996-05-01 00:05:00
LA  - en
M1  - 2725
PB  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor, Santa Clara, CA, USA
PY  - 1996
TI  - New Algorithm for the Measurement of Pitch in Metrology Instruments
ER  -