TY  - JOUR
AU  - Postek, Michael
AU  - Lowney, J
AU  - Vladar, Andras
AU  - Keery, William
AU  - Marx, Egon
AU  - Larrabee, Robert
C2  - Scanning
DA  - 1994-01-01 00:01:00
LA  - en
M1  - 16, Supp. IV
PB  - Scanning
PY  - 1994
TI  - Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology
ER  -