TY  - JOUR
AU  - Xiong, Hao
AU  - Heh, Dawei
AU  - Gurfinkel, Moshe
AU  - Li, Qiliang
AU  - Shapira, Yoram
AU  - Richter, Curt
AU  - Bersuker, Gennadi
AU  - Rino, Choi
AU  - Suehle, John
C2  - Materials Science and Engineering A-Structural Materials Properties Microstructure and Processing
DA  - 2007-09-30 00:09:00
LA  - en
M1  - 84
PB  - Materials Science and Engineering A-Structural Materials Properties Microstructure and Processing
PY  - 2007
TI  - Characterization of Electrically Active Defects in High-K Gate Dielectrics By Using Low Frequency Noise, Charge Pumping, and Fast Id-Vg measurements
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32633
ER  -