TY  - JOUR
AU  - Ehrstein, James
AU  - Richter, Curt
AU  - Chandler-Horowitz, Deane
AU  - Vogel, Eric
AU  - Young, Chadwin
AU  - Shah, Shweta
AU  - Maher, Dennis
AU  - Foran, Brendan
AU  - Diebold, Alain
C2  - Journal of the Electrochemical Society
DA  - 2006-01-03 00:01:00
LA  - en
M1  - 153
PB  - Journal of the Electrochemical Society
PY  - 2006
TI  - A Comparison of Thickness Values for Very Thin SiO2 Films by Using Ellipsometric, Capacitance-Voltage and HRTEM Measurements
ER  -