TY  - CONF
AU  - Dowell, Marla
AU  - Jones, Richard
AU  - Laabs, Holger
AU  - Cromer, Christopher
AU  - Morton, R.
C2  - Proc., SPIE, Metrology, Inspection, and Process Control for Microlithography XVI, Daniel J.C. Herr, Editor, Santa Clara, CA, USA
DA  - 2002-01-01 00:01:00
LA  - en
M1  - 4689
PB  - Proc., SPIE, Metrology, Inspection, and Process Control for Microlithography XVI, Daniel J.C. Herr, Editor, Santa Clara, CA, USA
PY  - 2002
TI  - New Developments in Excimer Laser Metrology at 157 nm
ER  -