TY  - GEN
AU  - Postek, Michael
AU  - Lowney, J
AU  - Vladar, Andras
AU  - Keery, William
AU  - Marx, E
AU  - Larrabee, Robert
C2  - Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD
DA  - 1993-08-01 00:08:00
LA  - en
PB  - Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD
PY  - 1993
TI  - X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth Measurement
ER  -