TY  - JOUR
AU  - Seraphin, S.
AU  - Krause, S.
AU  - Roitman, Peter
AU  - Simons, David
AU  - Cordts, B.
C2  - Applied Physics Letters
DA  - 1991-12-02 00:12:00
LA  - en
M1  - 59
PB  - Applied Physics Letters
PY  - 1991
TI  - Effect of Annealing Ambient on the Removal of Oxide Precipitates in High-Dose Oxygen-Implanted Silicon
ER  -