TY  - CONF
AU  - Chaparala, P
AU  - Suehle, John
AU  - Messick, C.
AU  - Roush, M.
C2  - 1995 IEEE International Integrated Reliability Workshop Final Report, Lake Tahoe, CA, USA
DA  - 1996-12-31 00:12:00
LA  - en
PB  - 1995 IEEE International Integrated Reliability Workshop Final Report, Lake Tahoe, CA, USA
PY  - 1996
TI  - Time-Dependent Dielectric Breakdown of Intrinsic SiO<sub>2</sub> Films Under Dynamic Stress
ER  -