TY  - CONF
AU  - Lee, V.
AU  - Lin, Eric
AU  - Lan, J
AU  - Cheng, Y
AU  - Liou, H
AU  - Wu, Wen-Li
AU  - Wang, Y
AU  - Feng, M
AU  - Chao, C
C2  - Characterization and Metrology for ULSI Technology: 2000 International Conference,  Gaithersburg, MD
DA  - 2000-01-01 00:01:00
LA  - en
PB  - Characterization and Metrology for ULSI Technology: 2000 International Conference,  Gaithersburg, MD
PY  - 2000
TI  - Investigation of N2 Plasma Effects on the Depth Profile of Hydrogen Silsesquioxane Thin Films Using High Resolution Specular X-Ray Reflectivity
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853664
ER  -