TY  - VIDEO
AU  - Nicoletti, A
AU  - Srinivasan, P
AU  - Riva, M
AU  - Benck, Eric
AU  - Goyette, A
AU  - Wang, Ying-Ju
AU  - Kim, J
AU  - Hsieh, P
AU  - Athayde, A
AU  - Joshi, Abhay
C2  - International Symp Plasma Chemistry
DA  - 2003-01-01 00:01:00
LA  - en
PB  - International Symp Plasma Chemistry
PY  - 2003
TI  - C<sub>4</sub>F<sub>6</sub> - 1,3 Hexafluorobutadiene - A New Etching Gas: Studies on Material Compatibility, Behavior in an Inductively Coupled Plasma and Etch Process Performance
ER  -