TY  - CONF
AU  - Josell, Daniel
AU  - Kim, S
AU  - Wheeler, Daniel
AU  - Moffat, Thomas
AU  - Pyo, S
C2  - Chemical Vapor Deposition, International Conference | 16th | | Electrochemical Society, Paris, 1, FR
DA  - 2003-04-01 00:04:00
LA  - en
M1  - No. 8
PB  - Chemical Vapor Deposition, International Conference | 16th | | Electrochemical Society, Paris, 1, FR
PY  - 2003
TI  - Quantifying Superconformal filling of the Submicrometer Features Through Surfactant Catalyzed Chemical Vapor Deposition
ER  -