TY  - JOUR
AU  - Campos, F
AU  - Weaver, G
AU  - Waltman, C
AU  - Leone, S
C2  - Journal of Vacuum Science and Technology B
DA  - 1992-01-01 00:01:00
LA  - en
M1  - 10
PB  - Journal of Vacuum Science and Technology B
PY  - 1992
TI  - Enhanced etching of Si(100) by neutral chlorine beams with kinetic energies up to 6 eV
ER  -