TY  - JOUR
AU  - Koseski, Ryan
AU  - Osborn, William
AU  - Stranick, Stephan
AU  - DelRio, Frank
AU  - Vaudin, Mark
AU  - Dao, Thuy
AU  - Adams, Vance
AU  - Cook, Robert
C2  - Journal of Applied Physics
DA  - 2011-10-11 00:10:00
LA  - en
PB  - Journal of Applied Physics
PY  - 2011
TI  - Micro-scale measurement and modeling of stress in silicon surrounding a tungsten-filled through-silicon via
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908908
ER  -