TY  - JOUR
AU  - Schmucker, Scott
AU  - Namboodiri, Pradeep
AU  - Kashid, Ranjit
AU  - Wang, Xiqiao
AU  - Hu, Binhui
AU  - Wyrick, Jonathan
AU  - Myers, Alline
AU  - Schumacher, Joshua
AU  - Silver, Richard
AU  - Stewart, Michael
C2  - Physical Review Applied
DA  - 2019-03-29 00:03:00
DO  - https://doi.org/10.1103/PhysRevApplied.11.034071
LA  - en
M1  - 11
PB  - Physical Review Applied
PY  - 2019
TI  - Low-resistance, high-yield electrical contacts to atom scale Si:P devices using palladium silicide
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=926446
ER  -