TY  - JOUR
AU  - Lavery, Kristopher
AU  - Vogt, B
AU  - Prabhu, Vivek
AU  - Lin, Eric
AU  - Wu, Wen-Li
AU  - Choi, Kwang-Woo
C2  - Journal of Vacuum Science and Technology B
DA  - 2006-11-30 00:11:00
LA  - en
M1  - 24
PB  - Journal of Vacuum Science and Technology B
PY  - 2006
TI  - Exposure Dose Effects on the Reaction-Diffusion Process in Model extreme ultraviolet Photoresists
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852653
ER  -