TY  - CONF
AU  - Lemaillet, Paul
AU  - Germer, Thomas
AU  - Kline, Regis
AU  - Sunday, Daniel
AU  - Wang, Chengqing
AU  - Wu, Wen-Li
C2  - Metrology, Inspection, and Process Control for Microlithography XXVII, San Jose, CA, US
DA  - 2013-04-08 00:04:00
LA  - en
PB  - Metrology, Inspection, and Process Control for Microlithography XXVII, San Jose, CA, US
PY  - 2013
TI  - Intercomparison between optical and x-ray scatterometry measurements of FinFET structures
ER  -