TY  - JOUR
AU  - Vogt, B
AU  - Kang, Shuhui
AU  - Prabhu, Vivek
AU  - Rao, Ashwin
AU  - Lin, Eric
AU  - Satija, Sushil
AU  - Turnquest, Karen
AU  - Wu, Wen-Li
C2  - Journal of Vacuum Science and Technology B
DA  - 2007-01-11 00:01:00
LA  - en
M1  - 25
PB  - Journal of Vacuum Science and Technology B
PY  - 2007
TI  - Influence of Base Additives on the Reaction Diffusion Front of Model Chemically Amplified Photoresists
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852647
ER  -