TY  - CONF
AU  - Choi, Kwang-Woo
AU  - Prabhu, Vivek
AU  - Lavery, Kristopher
AU  - Lin, Eric
AU  - Wu, Wen-Li
AU  - IV, John Woodward
AU  - Leeson, Michael
AU  - Cao, H
AU  - Chandhok, Manish
AU  - Thompson, George
C2  - Proceedings of SPIE, San Jose, CA, US
DA  - 2007-02-25 00:02:00
LA  - en
M1  - 6519
PB  - Proceedings of SPIE, San Jose, CA, US
PY  - 2007
TI  - Effect of Photoacid Generator Concentration and Developer Strength on the Patterning Capabilities of a Model EUV Photoresist
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852725
ER  -