TY  - CONF
AU  - Rao, Ashwin
AU  - Kang, Shuhui
AU  - Vogt, B
AU  - Prabhu, Vivek
AU  - Lin, Eric
AU  - Wu, Wen-Li
AU  - Turnquest, Karen
AU  - Hinsberg, W
C2  - Proceedings of SPIE, San Jose, CA, US
DA  - 2006-02-19 00:02:00
LA  - en
M1  - 6153
PB  - Proceedings of SPIE, San Jose, CA, US
PY  - 2006
TI  - Dissolution Fundamentals of 193-nm Methacrylate Based Photoresists
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852551
ER  -