TY  - JOUR
AU  - Goldfarb, D
AU  - Lin, Eric
AU  - Soles, Christopher
AU  - Trinque, B
AU  - Burns, S
AU  - Jones, Ronald
AU  - Lenhart, Joseph~undefined~undefined~undefined~undefined~undefined
AU  - Angelopoulos, M
AU  - Wilson, C
AU  - Satija, Sushil
AU  - Wu, Wen-Li
C2  - Microlithography World
DA  - 2021-10-12 15:10:19
LA  - en
PB  - Microlithography World
PY  - 2021
TI  - Chemically Amplified Photoresists Fundamental Properties and Limits of Applicability to Sub-100 nm Lithography
ER  -