TY  - JOUR
AU  - Ohmori, K
AU  - Ahmet, P
AU  - Yoshitake, M
AU  - Chikyow, T
AU  - Shiraishi, K
AU  - Yamabe, K
AU  - Watanabe, H
AU  - Akasaka, Y
AU  - Chang, Kao-Shuo
AU  - Green, Martin
AU  - Yamada, K
C2  - Journal of Applied Physics
DA  - 2007-08-13 00:08:00
LA  - en
M1  - 101
PB  - Journal of Applied Physics
PY  - 2007
TI  - Instability of Flatband Voltage in HfO2 Gate Stack Structures under Reducing/Oxidizing Annealing Conditions
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851023
ER  -