TY  - CONF
AU  - Jones, Ronald
AU  - Hu, T
AU  - Lin, Eric
AU  - Wu, Wen-Li
AU  - Casa, D
AU  - Orji, Ndubuisi
AU  - Vorburger, Theodore
AU  - Bolton, P
AU  - Barclay, Z
C2  - Metrology, Inspection and Process Control for Microlithography | 17th | Metrology, Inspection and Process Control for Microlithography XVII | SPIE, Undefined
DA  - 2003-06-01 00:06:00
LA  - en
M1  - 5038
PB  - Metrology, Inspection and Process Control for Microlithography | 17th | Metrology, Inspection and Process Control for Microlithography XVII | SPIE, Undefined
PY  - 2003
TI  - Sub-Nanometer Wavelength Metrology of Lithographically Prepared Structures: A Comparison of Neutron and X-Ray Scattering
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852192
ER  -