TY  - JOUR
AU  - Li, Bin
AU  - Luo, Zhiquan
AU  - Ho, Paul
AU  - Shi, Li
AU  - Rabenberg, Lew
AU  - Zhou, JiPing
AU  - Allen, Richard
AU  - Cresswell, Michael
C2  - Nanotechnology
DA  - 2009-02-25 00:02:00
LA  - en
M1  - 20
PB  - Nanotechnology
PY  - 2009
TI  - Controlled Formation and Resistivity Scaling of Nickel Silicide Nanolines
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32991
ER  -