TY  - CONF
AU  - Villarrubia, John
AU  - Ding, Zejun
C2  - Proceedings of SPIE Advanced Lithography, Vol 7272, San Jose, CA
DA  - 2009-03-31
LA  - en
PB  - Proceedings of SPIE Advanced Lithography, Vol 7272, San Jose, CA
PY  - 2009
TI  - Sensitivity of SEM width measurements to model assumptions
ER  -