TY  - JOUR
AU  - Lee, Hae-Jeong
AU  - Lin, Eric
AU  - Lan, J
AU  - Cheng, Y
AU  - Liou, H
AU  - Wu, Wen-Li
AU  - Wang, Y
AU  - Feng, M
AU  - Chao, C
C2  - Characterization and Metrology for ULSI Technology Conference
DA  - 2008-10-16 14:10:19
LA  - en
PB  - Characterization and Metrology for ULSI Technology Conference
PY  - 2008
TI  - Investigation of N<sub>2</sub> Plasma Effects on the Depth Profile of Hydrogen Silsesquioxane Thin Films Using High Resolution Specular X-Ray Reflectivity
ER  -