TY  - CONF
AU  - Evans, Christopher
AU  - Parks, R
AU  - Shao, L
AU  - Schmitz, Tony
AU  - Davies, Angela
C2  - SPIE International Symposium on Microlithography, Santa Clara, CA
DA  - 2001-02-28
LA  - en
M1  - 4344
PB  - SPIE International Symposium on Microlithography, Santa Clara, CA
PY  - 2001
TI  - Interferometric Testing of Photomask Blank Flatness
ER  -