TY  - CONF
AU  - Evans, Christopher
AU  - Parks, R
AU  - Shao, L
AU  - Schmitz, Tony
AU  - Davies, Angela
C2  - Metrology, Inspection and Process Control for Microlithography, Conference | 15th | Metrology, Inspection and Process Control for Microlithography XV | SPIE
DA  - 2001-08-01
LA  - en
M1  - 4344
PB  - Metrology, Inspection and Process Control for Microlithography, Conference | 15th | Metrology, Inspection and Process Control for Microlithography XV | SPIE
PY  - 2001
TI  - Interferometric Testing of Photomask Substrate Flatness
ER  -