TY  - CONF
AU  - Prabhu, Vivek
AU  - Wang, M
AU  - Jablonski, E
AU  - Vogt, B
AU  - Lin, Eric
AU  - Wu, Wen-Li
AU  - Goldfarb, D
AU  - Angelopoulos, M
AU  - Ito, H
C2  - Proceedings of SPIE, Santa Clara, CA
DA  - 2004-05-01
LA  - en
M1  - 5376
PB  - Proceedings of SPIE, Santa Clara, CA
PY  - 2004
TI  - Fundamentals of Developer-Resist Interactions for Line-Edge Roughness and Critical Dimension Control in Model 248 nm and 157 nm Photoresists
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852336
ER  -