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Sushil K Satija (Fed)

Publications

Chemically Amplified Photoresists Fundamental Properties and Limits of Applicability to Sub-100 nm Lithography

Author(s)
D M. Goldfarb, Eric K. Lin, Christopher Soles, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Wilson, Sushil K. Satija, Wen-Li Wu
State-of-the-art lithographic technologies combine chemically amplified photoresists and sophisticated radiation sources to delineate patterned areas with high
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Created October 9, 2019, Updated December 8, 2022