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Material Measurement Laboratory

Materials Science and Engineering Division

MML Microscopy Facility Instrumentation

The MML Microscopy Facility is administered by the Materials Science and Engineering Division of the Material Measurement Laboratory. The facility includes: three TEMs, three SEMs, specimen preparation equipment, and an image analysis center.

	FEI Titan 80-300 STEM 300 keV, 200 keV and 80 keV accelerating voltages 0.136 nm point-to-point STEM resolution 0.19 nm point-to-point TEM resolution 1.8 nm Lorentz resolution ±45° specimen tilt Energy loss spectroscopy X-ray microanalysis Electron biprism for holography 2k CCD image acquisition Electron tomography holders Electron transport/biasing holder Analytical specimen holder
	JEOL JEM3010 UHR-TEM 300 keV accelerating voltage 0.17 nm point-to-point resolution ±15° specimen tilt Energy loss spectroscopy Energy-filtered imaging (atomic scale) X-ray microanalysis MSC-CCD image acquisition Scanning TEM capability High temperature holder Analytical specimen holder
	Hitachi S-4700-II FE-SEM 1 to 30 keV accelerating voltage 1.5 nm resolution at 30 keV 2.5 nm resolution at 1 keV 70° specimen tilt Electron back-scatter detector (CCD) system Phase ID capability X-ray microanalysis Specimen sizes up to 150 mm diameter wafer
	FEI CM30 TEM 300 keV accelerating voltage 0.22 nm point-to-point resolution ±40° specimen tilt X-ray microanalysis Parallel energy loss spectroscopy CCD camera High temperature double-tilt holder Low temperature single-tilt holder Analytical double-tilt holder
	JEOL JSM6400 SEM 5 to 30 keV accelerating voltage 5 nm resolution at 30 keV Electron back-scatter detector system Phase ID capability >70° specimen tilt X-ray microanalysis
	Specimen Preparation VCR Dimpler Dimple Grinder Tripod wedge polishers Precision ion-polishing system (PIPS) XLA2000 low angle ion mill (w/cold stage, ion termination) Duo ion mill (w/LN2 cold stage) Ultrasonic disc cutter Diamond blade wafer cutter Optical microscopes with digital image acquisition
	Image Analysis PC and Mac workstations Accelrys image simulation software 4800 ppi (14-bit) image scanner Dye-sublimation printers Lots o' software Coffee...

Materials, Nanometrology and Nanomaterials

Created March 6, 2009, Updated September 21, 2016