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PUBLICATIONS

At-Wavelength Metrology for EUV Lithography at NIST

Published

Author(s)

Charles S. Tarrio, Steven E. Grantham, Robert E. Vest, Thomas B. Lucatorto

Abstract

The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mirror endurance testing.
Citation
International Extreme Ultraviolet Lithography Symposium
Pub Type
Journals

Keywords

endurance testing, environmental testing, extreme ultraviolet, lithography, radiometry, reflectometry

Citation

Tarrio, C. , Grantham, S. , Vest, R. and Lucatorto, T. (2009), At-Wavelength Metrology for EUV Lithography at NIST, International Extreme Ultraviolet Lithography Symposium (Accessed December 30, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created July 14, 2009, Updated February 17, 2017