A Microarray Approach for Optimizing Localized Deposition of Carbon Nanotubes Using Microhotplate Arrays

Published

January 1, 2004

Author(s)

C J. Taylor, Richard E. Cavicchi, Christopher B. Montgomery, Shirley Turner

Abstract

A 340-element array of microhotplates is used to characterize the chemical vapor deposition growth of carbon nanotubes and nanofibers under a variety of process conditions. One dimension of the 17 by 20 element array was used to vary the thickness of a Ni catalyst layer. The second dimension was used for temperature control. Growth took place in an ambient temperature gas-flow system, with processes only occurring on activated heaters. This allows different process sequences to be defined on different columns of the array. Four parameters were varied: pre-anneal temperature of the catalyst, the growth temperature of the carbon nanostructures, growth pressure, and growth time. Scanning electron microscope images of each array element revealed trends in microstructure as these parameters, together with catalyst thickness are varied.

Citation

Nanotechnology

Volume

15

Issue

No. 1

Pub Type

Journals

Download Paper

https://doi.org/10.1088/0957-4484/15/1/012

Local Download

Keywords

acetylene, chemical vapor deposition, combinatorial, microhotplate, nanotube

Citation

Taylor, C. , Cavicchi, R. , Montgomery, C. and Turner, S. (2004), A Microarray Approach for Optimizing Localized Deposition of Carbon Nanotubes Using Microhotplate Arrays, Nanotechnology, [online], https://doi.org/10.1088/0957-4484/15/1/012, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=830827 (Accessed December 30, 2024)