Simple, Compact, High-Purity Cr Evaporator for UHV

Published

September 1, 1993

Author(s)

Jabez J. McClelland, John Unguris, R E. Scholten, Daniel T. Pierce

Abstract

A simple, compact Cr evaporator is constructed by electroplating Cr metal onto the tip of a W hairpin filament. At 5 cm from the evaporator, deposition rates up to 10 nm min^-1 (flux {asymp} 10¹⁹ atoms m^-2s^-1) have been obtained, with total deposition thickness in excess of 400 nm. Auger analyses of thin film deposited in ultrahigh vacuum show impurities below detectability.

Citation

Journal of Vacuum Science and Technology A

Volume

11

Issue

5

Pub Type

Journals

Citation

McClelland, J. , Unguris, J. , Scholten, R. and Pierce, D. (1993), Simple, Compact, High-Purity Cr Evaporator for UHV, Journal of Vacuum Science and Technology A (Accessed March 14, 2025)