Embodiments of the present invention relate to an ellipsometer that includes a combination of a plurality of reflective devices to measure a Mueller matrix reflectance of a material in the VUV and EUV region. Ellipsometer in accordance with embodiments of the present invention relate to an ellipsometer that includes a multi-mirror polarization state generator combined with a multi-mirror polarization state analyzer and a detector to realize a Mueller matrix ellipsometer. Embodiments of the present invention utilize two rotating assemblies with each assembly including multiple mirrors that combine to act as amplitude and phase retarders.