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John H. Burnett (Fed)

John Burnett has been a physicist at NIST since 1994. His principal area of research is experimental studies on the optical properties of solids and liquids, for wavelengths from vacuum ultraviolet through mid-infrared. Particular focuses have been on the index and birefringence properties of optical materials important for the semiconductor lithography industry and the infrared optics communities. He is presently leading a program of remeasuring and publishing the index of refraction of technologically important optical materials at substantially higher accuracies than available in the literature, especially in the infrared. This is made possible by the development of a unique refractometer system that enables diffraction-limited measurements for wavelengths from 0.12 µm to 15 µm. This program is directed at assisting in the development of more advanced optical imaging systems.

He is a member of the American Physical Society, the Optical Society of America, SPIE, and the Phi Beta Kappa Society.

His awards include: U.S. Department of Commerce 2000 Silver Medal Award for Scientific Achievement, 2002 Arthur S. Flemming Scientific Award, U.S. Department of Commerce 2002 Silver Medal Award for Scientific Achievement, NIST 2006 William P. Slichter Award. He has been awarded 1 patent.

Research Projects

Selected Publications

Index of refraction of germanium

Author(s)
John H. Burnett, Eric C. Benck, Simon G. Kaplan, Erik Stover, Adam Phenis
Measurements of the index of refraction of a sample of high-quality, single-crystal germanium using the minimum deviation refractometry method are presented for

Publications

Index of refraction of germanium

Author(s)
John H. Burnett, Eric C. Benck, Simon G. Kaplan, Erik Stover, Adam Phenis
Measurements of the index of refraction of a sample of high-quality, single-crystal germanium using the minimum deviation refractometry method are presented for

Refractive index measurements of Ge

Author(s)
John H. Burnett, Simon G. Kaplan
A program has been started at NIST to make high-accuracy measurements of the infrared (IR) index properties of technologically important IR materials, in order

Binary amplitude holograms made from dyed photoresist

Author(s)
Quandou (. Wang, Ulf Griesmann, John H. Burnett
A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null

Nanoelectronics Lithography

Author(s)
Stephen Knight, Vivek Prabhu, John H. Burnett, James Alexander Liddle, Christopher Soles, Alain C. Diebold
This is a compiled chapter that will be included into the Handbook of Nanophysics.
Created October 9, 2019, Updated December 8, 2022