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Thomas P. Moffat (Fed)

Research Interests include:

  • Electrochemical surface science
  • Electrochemical deposition 
  • Electrocatalysis

Dr. Moffat is with the Functional Nanostructured Materials group in the Material Measurement Laboratory at NIST. He began his research career as an undergraduate student working part time in the laboratory of Barry Lichter and William Flanagan at Vanderbilt University. After receiving his B.E. in 1982 and M.Sc. in 1984, he joined Ron Latanision’s group in the H.H. Uhlig Laboratory at MIT. In 1989, he received a Sc.D. degree for his work exploring the chemical passivity of chromium-based metallic glasses. This was followed by a two year stint as a postdoctoral associate in Allen Bard’s chemistry laboratory at the University of Texas, Austin studying the corrosion and passivation of metals using scanning tunneling microscopy. Since joining NIST in 1991, Dr. Moffat’s efforts have focused on the application of electroanalytical and surface science methods to understand the structure, composition, and electrochemical performance of thin films. Exploration into surfactant mediated electrochemical deposition of microelectronic interconnects and, more recently, electrocatalysts have been of particular interest. For his work on superconformal electrodeposition, he received NIST’s Samuel Wesley Stratton Award (2011), named after the first director of the Institute, the Research Award of the ECS Electrodeposition Division (2006) and the Gold Medal award of the United States Department of Commerce (2001). To date he has authored or co-authored more than 200 technical papers. He was elected a Fellow of the Electrochemical Society in 2009. Dr. Moffat is an active member of the Electrochemical Society, International Society of Electrochemistry, Materials Research Society and American Association for the Advancement of Science.

Google Scholar 

National Research Council Postdoctoral Fellowship – Sponsors U.S. citizens to explore the frontiers of science related to NIST mission. Please contact us if you're interested in this wonderful program. New topics are always welcome in addition to the following existing opportunities.


Electrochemical Surface Science of Metal-Electrolyte Interfaces: Theory and Experiment

Proximal Probe Studies of the Electrode-Electrolyte Interface

 

Publications

Bottom-up Au Filling of Trenches in Curved Wafers

Author(s)
Daniel Josell, Thomas P. Moffat, Thomas Gnaupel-Herold, David Raciti, Martin Stauber, Yu Q, Liyang Chen, M Rawlik, Marco Stampanoni, Lucia Romano
A 〖Bi〗^(3+)-stimulated Au electrodeposition process in slightly alkaline 〖Na〗_3 Au(〖SO〗_3 )_2+〖Na〗_2 〖SO〗_3 electrolytes has been previously demonstrated for

Patents (2018-Present)

Curved Metallic Grating And Process For Making Same

NIST Inventors
Daniel Josell and Thomas P. Moffat
Making a curved metallic grating for matching angular divergence of incident radiation includes: providing a mandrel with a curved receiving surface; disposing a planar substrate on the curved receiving surface; applying a clamping force to the planar substrate at the planar field surface; bending

Process for Making a Metallic Grating

NIST Inventors
Daniel Josell and Thomas P. Moffat
A metallic grating is formed to include a substrate; a plurality of high aspect ratio trenches disposed in the substrate such that the high aspect ratio trenches are spaced apart from one another by a field surface of the substrate; a metallic superconformal filling formed and disposed in the high

Metallic Grating

NIST Inventors
Daniel Josell and Thomas P. Moffat
A metallic grating includes a substrate; a plurality of high aspect ratio trenches disposed in the substrate such that the high aspect ratio trenches are spaced apart from one another by a field surface of the substrate; a metallic superconformal filling formed and disposed in the high aspect ratio

Process for Forming a Transition Zone Terminated Superconformal Filling

NIST Inventors
Daniel Josell and Thomas P. Moffat
Forming a transition zone terminated superconformal filling in a recess includes: providing an electrodeposition composition including: a metal electrolyte including a plurality of metal ions, solvent, and suppressor; providing the article including: a field surface and the recess that includes a
Created October 9, 2019, Updated January 24, 2023