John Gillaspy, Metastable Atom Lithography (1994-1999)

For more information about my work on metastable atom lithography, consult the following papers:

1. K. Berggren, A. Bard, J.L. Wilbur, J.D. Gillaspy, A.G. Helg, J.J. McClelland, S.L. Rolston, W.D. Phillips, M. Prentiss, and G.M. Whitesides, "Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers," Science 269, 1255 (1995).
2. J.D. Gillaspy, K.K. Berggren, A. Bard, J.L. Wilbur, J.J. McClelland, S.L. Rolston, W.D. Phillips, M. Prentiss, and G.M. Whitesides, "Metastable Atom Lithography: A New Technique for Creating Nanostructures," IEEE LEOS 10(February), 9 (1996).
3. A. Bard, K.K. Berggren, J.L. Wilbur, J.D. Gillaspy, S.L. Rolston, J.J. McClelland, W.D. Phillips, M. Prentiss, and G.M. Whitesides, "Self-Assembled Monolayers Exposed by Metastable Argon and Metastable Helium for Neutral Atom Lithography and Atomic Beam Imaging," J. Vac. Sci. Technol. B15, 1805 (1997).
4. L.P. Ratliff, R. Minniti, A. Bard, E.W. Bell, J.D. Gillaspy, D. Parks, A.J. Black, and G.M. Whitesides, "Exposure of self-assembled monolayers to highly charged ions and metastable atoms," Appl. Phys. Lett. 75, 590 (1999).