Potzick, J.
(1994),
Accuracy in Integrated Circuit Dimensional Measurements, SPIE-International Society for Optical Engineering,
(Accessed October 31, 2024)
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Accuracy in Integrated Circuit Dimensional Measurements
Published
Author(s)
Abstract
The measurement of critical dimensions of features on integrated circuits and photomasks is modeled as the comparison of the images of the test object and of a standard object in a measuring device. A length measuring instrument is then a comparator. The calibration of the standard and the conditions necessary for a valid comparison are discussed. The principles discussed here apply to many other types of measurement as well.Citation
Chapter 3 in: Handbook of Critical Dimension Metrology and Process Control
Publisher Info
SPIE-International Society for Optical Engineering,
Pub Type
Books
Keywords
accuracy, measurement, measurement uncertainty, modeling, traceability
Citation
Issues
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Created December 1, 1994, Updated February 19, 2017