Potzick, J.
(1994),
Accuracy in Integrated Circuit Dimensional Measurements, SPIE-International Society for Optical Engineering,
(Accessed April 3, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Accuracy in Integrated Circuit Dimensional Measurements
Published
Author(s)
Abstract
The measurement of critical dimensions of features on integrated circuits and photomasks is modeled as the comparison of the images of the test object and of a standard object in a measuring device. A length measuring instrument is then a comparator. The calibration of the standard and the conditions necessary for a valid comparison are discussed. The principles discussed here apply to many other types of measurement as well.Citation
Chapter 3 in: Handbook of Critical Dimension Metrology and Process Control
Publisher Info
SPIE-International Society for Optical Engineering,
Pub Type
Books
Keywords
accuracy, measurement, measurement uncertainty, modeling, traceability
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 1, 1994, Updated February 19, 2017