Applying a Methodology for Microtensile Analysis of Thin Films

Published

June 1, 2002

Author(s)

B Yeung, Alan M. Lytle, V Sarihan, David T. Read, Y F. Guo

Abstract

A Microtensile methodology, developed at The National Institute of Standards and Technology (NIST), has been adopted and applied in Motorola to evaluate material properties of thin films. this methodology is a significant part of the materials technology development at Motorola. Special thin film metal specimens are designed and produced based on common microlithography techniques and silicon processing methods. The experimentation is performed using the Microtensile tester, which was developed for the accurate measurement of constitutive properties of thin films. Through the application of the techniques presented here, valuable information and results have been achieved, which provide an extended information base for thin film materials. Ultimately, such data are applied to processing and reliability predictions and the optimization of thin film processes and materials.

Citation

Solid State Technology

Volume

45

Issue

No. 6

Pub Type

Journals

Keywords

ductility, elastic nicket, piezo-actuated, strength, tensile

Citation

Yeung, B. , Lytle, A. , Sarihan, V. , Read, D. and Guo, Y. (2002), Applying a Methodology for Microtensile Analysis of Thin Films, Solid State Technology (Accessed April 26, 2025)