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Chapter 9. Radio frequency scanning probe measurements of materials

Published

Author(s)

Thomas M. Wallis, Pavel Kabos

Abstract

Preceding chapters have described the near field scanning microwave microscope (NSMM), while discussing both the underlying theory of operation and practical considerations for instrumentation. A primary application area for NSMMs and related microscopes is broadband, local metrology of materials with nanometer-scale spatial resolution. Several methods for spatially-resolved characterization of materials are reviewed in this chapter. We begin by reviewing the fundamental concepts of electromagnetic materials metrology. Furthermore, since the extraction of quantitative information from NSMM measurements requires appropriate modeling of the measurement system, we will describe strategies for modeling probe-material interactions. Once the fundamental concepts and models have been established, we will review several applications of scanning-probe-based metrology to local, electromagnetic materials characterization.
Citation
Measurement Techniques for Radio Frequency Nanoelectronics
Publisher Info
Cambridge University Press, Cambridge, -1

Keywords

scanning microwave microscopy, nanoelectronics, microwave metrology, materials measurements

Citation

Wallis, T. and Kabos, P. (2017), Chapter 9. Radio frequency scanning probe measurements of materials, Cambridge University Press, Cambridge, -1, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=921885 (Accessed October 31, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created September 17, 2017, Updated May 2, 2018