Williams, D.
, Marks, R.
and Davidson, A.
(1991),
Comparison of On-Wafer Calibrations, Tech Dig., Auto. RF Tech. Group Conf., San Diego, CA, [online], https://doi.org/10.1109/ARFTG.1991.324040
(Accessed December 15, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Comparison of On-Wafer Calibrations
Published
Author(s)
, , A. Davidson
Abstract
A powerful new verification technique determines the measurement accuracy of scattering parameter calibrations. The technique determines the relative reference impedance, reference plane offset, and the worst-case measurement deviations of any calibration from a benchmark calibration. The technique is applied to several popular on-wafer scattering parameter calibrations, and the deviations between those calibrations and the thru-reflect line calibration are quantified.Proceedings Title
Tech Dig., Auto. RF Tech. Group Conf.
Volume
20
Conference Location
San Diego, CA
Pub Type
Conferences
Download Paper
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 1, 1991, Updated November 10, 2018