Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

EUV testing of multilayer mirrors: critical issues

Published

Author(s)

Shannon B. Hill, I Ermanoski, Steven E. Grantham, Charles S. Tarrio, Thomas B. Lucatorto, T. E. Madey, Sasa Bajt, M Chandhok, P Yan, Obert Wood, S Wurm, N V. Edwards
Proceedings Title
Emerging Lithographic Technologies X
Volume
S
Conference Dates
February 2, 2006
Conference Location
San Jose, CA
Conference Title
SPIE 6151

Citation

Hill, S. , Ermanoski, I. , Grantham, S. , Tarrio, C. , Lucatorto, T. , Madey, T. , Bajt, S. , Chandhok, M. , Yan, P. , Wood, O. , Wurm, S. and Edwards, N. (2006), EUV testing of multilayer mirrors: critical issues, Emerging Lithographic Technologies X , San Jose, CA (Accessed November 23, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 2006, Updated February 17, 2017