Fabrication and Measurement of Tall Stacked Arrays of SNS Josephson Junctions

Published

June 1, 2005

Author(s)

Nicolas Hadacek, Paul Dresselhaus, Yonuk Chong, Samuel Benz, John E. Bonevich

Abstract

We have made tall, uniform stacked Josephson junction arrays by developing an etch process using an inductively coupled plasma etcher. This process produces vertical profiles in thin-film multilayers of alternating superconducting and normal metals. Such a vertical etch is necessary to obtain uniform properties in high-density arrays in order to achieve operating margins for voltage standard applications. We use dry-etchable MoSi₂for the normal metal barrier of our niobium Josephson junctions and obtain working series arrays with stacks up to 10 junctions tall. We present dc and microwave electrical characteristics of distributed and lumped arrays and discuss the technological improvements needed to fabricate lumped arrays for voltage standard applications.

Citation

IEEE Transactions on Applied Superconductivity

Volume

15

Issue

2

Pub Type

Journals

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Local Download

Keywords

Josephson junction, lumped array, MoSi₂, multilayer, voltage standard

Citation

Hadacek, N. , Dresselhaus, P. , Chong, Y. , Benz, S. and Bonevich, J. (2005), Fabrication and Measurement of Tall Stacked Arrays of SNS Josephson Junctions, IEEE Transactions on Applied Superconductivity, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=31823 (Accessed December 26, 2024)