U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

PUBLICATIONS

Influence of substrate on crystallization in polythiophene/fullerene blends

Published

Author(s)

Lee J. Richter, Christine He, David Germack, R Joseph Kline, Dean DeLongchamp, Daniel A. Fischer, Chad R. Snyder, James G. Kushmerick

Abstract

The nanoscale morphology of the active layer in organic, bulk heterojunction (BHJ) solar cells is crucial to device performance. Often a combination of casting conditions and post deposition thermal treatment are used to optimize the morphology. In general, the development of microscopic crystals is deleterious, as the exciton diffusion length is 10 nm. We find that the microscopic crystallization kinetics in polythiophene/fullerene blends are strongly influenced by the substrate on which the BHJ is cast. This has significant implications for the practical screening of thermal treatments and the mechanisms for crystal growth.
Citation
Solar Energy Materials and Solar Cells
Volume
95
Pub Type
Journals

Download Paper

https://doi.org/10.1016/j.solmat.2010.12.035
Local Download

Keywords

"energy", "nanotechnology", "photovoltaics", "polymer", "fullerene", "crystallization", "microscopy", "AFM", "NEXAFS".
Polymers, Materials, Energy, Composition and structure, Chemistry, Biomaterials, Analytical chemistry and Alternative energy

Citation

Richter, L. , He, C. , Germack, D. , Kline, R. , DeLongchamp, D. , Fischer, D. , Snyder, C. and Kushmerick, J. (2011), Influence of substrate on crystallization in polythiophene/fullerene blends, Solar Energy Materials and Solar Cells, [online], https://doi.org/10.1016/j.solmat.2010.12.035, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905180 (Accessed December 3, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 13, 2011, Updated April 11, 2023