Kinetics of Photodegradation and Nanoparticle Surface Accumulation of a Nanosilica/Epoxy Coating Exposed to UV Light

Published

April 11, 2016

Author(s)

Li Piin Sung, Justin Gorham, Deborah Jacobs, Savelas A. Rabb, Lee L. Yu, Tinh Nguyen

Abstract

Temperature effect on the kinetics of photodegradation, surface accumulation of nanoparticles, and nanoparticle release in an epoxy nanocoating exposed to ultraviolet light (UV) was investigated. A model epoxy coating containing 5 % untreated nanosilica was selected. Exposed film specimens were removed at specified UV dose intervals for measurements of chemical degradation of the epoxy component, nanosilica accumulation on specimen surface, and nanosilica release as a function of UV dose for four temperatures. The chemical degradation was measured using Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and UV-visible spectroscopy (UV-Vis). Atomic force microscopy (AFM) was employed to determine the kinetics of nanosilica accumulation on the nanocoating surface during UV exposure. The temperature dependence behaviors of kinetic parameters obtained by various measurement techniques will be used to better understand the degradation mechanism and surface accumulation of nanoparticles in exterior nanocoatings.

Conference Dates

April 11-13, 2016

Conference Location

Indianapolis, IN, US

Conference Title

Proceeding of American Coatings CONFERENCE

Pub Type

Conferences

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Keywords

AFM, FTIR, Nanosilica, nanoparticle release, urface morphology, UV exposure, X-ray photoelectron spectroscopy

Citation

Sung, L. , Gorham, J. , Jacobs, D. , Rabb, S. , Yu, L. and Nguyen, T. (2016), Kinetics of Photodegradation and Nanoparticle Surface Accumulation of a Nanosilica/Epoxy Coating Exposed to UV Light, Proceeding of American Coatings CONFERENCE, Indianapolis, IN, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=920106 (Accessed March 14, 2025)