da Silva, F.
, Pappas, D.
and Wang, C.
(2003),
Magnetic Thin Film Interlaboratory Comparison, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD
(Accessed December 21, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Magnetic Thin Film Interlaboratory Comparison
Published
Author(s)
Fabio C. da Silva, , C. M. Wang
Abstract
A potential low magnetic moment standard reference material (SRM) was studied in an interlaboratory comparison. The mean and the standard deviation of the saturation moment ms, the remanent moment mr, and the intrinsic coercivity Hc of nine samples were extracted from hysteresis-loop measurements. Samples were measured by thirteen laboratories using inductive-field loopers, vibrating sample magnetometers, alternating-gradient force magnetometers, and superconducting quantum-interference-device magnetometers. NiFe films on Si substrates had saturation moment measurements reproduced within 5 % variation among the laboratories. The results showCitation
Journal of Research (NIST JRES) -
Volume
108
Issue
2
NIST Pub Series
Pub Type
NIST Pubs
Keywords
interlaboratory comparison, magnetic films, standard reference material
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created February 28, 2003, Updated October 12, 2021