Li, H.
, Ono, R.
, Vale, L.
, Rudman, D.
and Liou, S.
(1996),
A Novel Multilayer Circuit Process Using YBa<sub>2</sub>Cu<sub>3</sub>O<sub>x</sub>/SrTiO<sub>2</sub> Thin Films Patterned by Wet Etching and Ion Milling, Applied Physics Letters
(Accessed July 17, 2024)
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A Novel Multilayer Circuit Process Using YBa2Cu3Ox/SrTiO2 Thin Films Patterned by Wet Etching and Ion Milling
Published
Author(s)
H. Q. Li, , , , Sy-Hwang Liou
Citation
Applied Physics Letters
Volume
69
Issue
18
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created September 30, 1996, Updated October 12, 2021