Attota, R.
and Kramar, J.
(2016),
Optimizing noise for defect analysis with through-focus scanning optical microscopy, SPIE Advanced Lithography, San Jose, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=920308
(Accessed January 14, 2025)
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Optimizing noise for defect analysis with through-focus scanning optical microscopy
Published
Author(s)
,
Proceedings Title
SPIE Advanced Lithography
Conference Dates
February 21-25, 2016
Conference Location
San Jose, CA
Conference Title
Metrology, Inspection, and Process Control for Microlithography
Pub Type
Conferences
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Keywords
TSOM, nanometrology, optical metrology, far-filed imaging, through-focus scanning optical microscopy
Citation
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If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created March 25, 2016, Updated February 19, 2017