Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Polarized Light Scattering by Dielectric and Metallic Spheres on Silicon Wafers

Published

Author(s)

Jae H. Kim, S H. Ehrman, George W. Mulholland, Thomas Germer

Abstract

The Polarization and intensity of light scattered by monodisperse polystyrene latex and copper spheres, with diameters ranging from 92 to 218 nm, deposited on silicon substrates were measured with 442-, 532-, and 633-nm light. The results are compared with a theory for scattering by a sphere on a surface, originally developed by others [Physica A 137, 209 (1986),], and extended to include coatings on the sphere and the substrate. The results show that accurate calculation of the scattering of light by a metal sphere requires that the near-field interaction between the sphere and its image be included in a complete manner. The normal-incidence approximation does not suffice for this interaction, and the existence of any thin oxide layer on the substrate must be included in the calculation.
Citation
Applied Optics
Volume
41
Issue
No. 25

Keywords

copper, inspection, optics, particles, polystyrene, scattering, spheres

Citation

Kim, J. , Ehrman, S. , Mulholland, G. and Germer, T. (2002), Polarized Light Scattering by Dielectric and Metallic Spheres on Silicon Wafers, Applied Optics (Accessed November 28, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created August 31, 2002, Updated October 12, 2021